https://publications-cnrc.canada.ca/fra/voir/objet/?id=0f328e26-d0ca-4a85-8fae-e4f314a540d0
Rechercher Nelson-Fitzpatrick, Nathan; Rechercher Guthy, Csaba; Rechercher Poshtiban, Somayyeh; Rechercher Finley, Eric; Rechercher Harris, Kenneth D; Rechercher Worfolk, Brian J; Rechercher Evoy, Stephane
Journal of Vacuum Science and Technology A: Vacuum, 2013, Volume : 31, Numéro : 2
Films of titanium nitride were grown by atomic layer deposition (ALD) over a range of temperatures from 120 °C to 300 °C, and their deposition rates were...
Article de périodique (revue)